WAFER PROFILER CVP21

The Wafer Profiler CVP21 is a handy tool  to measure doping profiles in semiconductor layers by Electrochemical Capacitance Voltage Profiling (ECV-Profiling, CV-Profiling) in semiconductor research or production.
This ECV Profiler (CV-Profiler, C-V-Profiler) furthermore is a very good choice to analyze or develop strategies for Photo-Electrochemical Wet Etching (PEC-Etching) of semiconductors.

The comparison list shows that ECV-Profiling is a very valuable and handy SOLUTION to check the doping.

CVP21 with footprint 60(W)*80(D)*195(H)cm,
to minimize space requirements in clean room.

CVP21 is the COMPLETE SOLUTION:

CVP21 supports the COMPLETE spectrum of materials:

  • Group IV semiconductors as Silicon (Si), Germanium (Ge), Silicon Carbide (SiC), or

  • III-V semiconductors as Gallium Arsenide (GaAs), Indium Phosphide (InP), Gallium Phosphide (GaP), ..., or

  • ternary III-V alloys as Aluminum Gallium Arsenide (AlGaAs), Gallium Indium Phosphide (GaInP), Aluminium Indium Arsenide (AlInAs) ..., or

  • quaternary III-V alloys as Aluminum Gallium Indium Phosphide (AlGaInP), ..., or

  • Nitrides, as Gallium Nitride (GaN), Aluminum Gallium Nitride (AlGaN), Indium Gallium Nitride (InGaN) or Aluminum Indium Nitride (AlInN), or

  • II-VI semiconductors as Zinc Oxide (ZnO), Cadmium Telluride (CdTe), Mercury Cadmium Telluride (HgCdTe, MCT)..., or

  • less commonly used semiconductors (please contact us for sample measurements).

CVP21 supports the COMPLETE sample range:

  • Stacked layers are no problem (the material, the doping and the doping type may vary).

  • No Restrictions concerning the substrate (may be conductive or insulating).

  • Sample size: 4*2 mm▓ to complete 8" wafer size are standard (smaller samples on request).

CVP21 supports the COMPLETE resolution range:

  • Concentration resolution < 1012 cm-3 to > 1021 cm-3 (*).

  • Depth resolution 1 nm to 100 Ám (*).

(*) may depend on material type/ sample quality. Please ask for sample measurements

 

CVP21 comes as a  COMPLETE measurement system:

  • High Reliability system (special concern on electronics, mechanics, optics and fluid system).

  • Calibration-free system (Complete self calibrating electronic system - no needs for cable capacitance calibration).

  • Easy-to-use (Software optimized with full user management - easily used as well in production as in laboratory environment).

  • Wafer-Stepping (Complete wafer stepper is optionally available - to process several measurements on a wafer in full automation).

  • Camera-Control (The process is controlled on-line by a color camera - after each measurement camera data is available in film strip format).

  • Recipes (Measurement recipes are pre-defined and may easily modified by a user with higher priority).

  • Dry-In / Dry-Out: Auto-Load / Unload / Reload (The loading/ un-loading and re-loading of the electrochemical cell is automated and may be easily modified by a user with higher priority. The samples are processed dry-in / dry-out).

 


CVP21 as a table-top unit
(not shown: PC with monitor and printer, and drain can for used electrolyte).

CVP21 can be delivered:

  • either as a table-top unit (width 60 cm, depth 80 cm, additional space for PC, monitor, keyboard, printer, and drain can required),

  • or with a footprint of 60*80 cm to minimize space requirements in clean room.

CVP21 installation requirements:

  • Nitrogen or dry air with adjustable pressure 2..5 bar, tube with ID4/OD6mm (to automatically dry the sample after the measurement),

  • Exhaust, tube with ID 3/4" (to allow operation with bad smelling electrolytes, e. g. ammonium based electrolytes),

  • Vacuum of typically 0.2 bar, tube with ID4/OD6mm (to hold larger samples on the wafer hood), and

  • 230V(-15%/+10%), 50-60Hz, 500VA-1000VA (voltage 100V/110V optionally available).


The benefit list compares our equipment CVP21 to other ECV equipment.
Patents: DE-10256821, US-7026255 (furthers pending).

 

Application requirements:

Our solutions:

Production applications

Easy, clear and automatic operation

Research applications

High flexibility of the configuration recipes

Long process times

Very high reliability

Huge data streams

Clear and reliable data storage and backup

Further information: PDF Flyer (230kB)